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SILICON CARBIDE MESH PACKING
Applications
● Fine Chemicals and Highly Corrosive Distillation
● High-Purity Chemicals for the Semiconductor Industry
● Environmental Protection: Exhaust Gas Treatment and Waste Acid Recovery
● New Energy Industry Chain
● General Chemical Unit Operations
Corrugated silicon carbide mesh packing is a new type of tower internals fabricated by precision stamping porous silicon carbide (SiC) mesh into regular corrugated structures.
Breaking through the performance bottlenecks of traditional metal packings and ordinary ceramic packings, it features outstanding corrosion resistance, high temperature resistance, low pressure drop and high mass transfer efficiency. It can fully replace high-end metal packings such as Hastelloy, titanium alloy and stainless steel, and is widely applied in precise chemical separation processes featuring strong corrosion, high purity requirements and high temperature.
Suitable for vacuum rectification and precise separation processes involving various strongly acidic, halogen-containing and highly corrosive media. Main applicable industries include chlor-alkali chemistry, fluorochemicals, coal chemical industry, pharmaceutical intermediates and natural flavors.
It enables high-precision separation of trichlorosilane, silicon tetrachloride, halogenated organics, crude phenols and acidic solvents, solving industry pain points such as corrosive failure of metal packings and material contaminatio
② High-Purity Chemicals for Semiconductor & Electronics
Silicon carbide releases no metal ions or impurities, making it the core tower internal component for high-purity chemical production.
It is mainly used for purification of electronic-grade hydrochloric acid, nitric acid, hydrofluoric acid and other wet electronic chemicals, rectification of high-purity organic solvents, and scrubbing & purification of electronic specialty gases, perfectly meeting the ultra-high purity production standards of the semiconductor industry.
Applicable to scrubbing and absorption processes for highly corrosive tail gas, including purification of hydrogen chloride, hydrogen fluoride, sulfur oxides and nitric acid tail gas.
It can also be used for solvent recovery of corrosive VOC organic waste gas, concentration rectification of waste acid, and regeneration of industrial pickling waste liquid, with long corrosion resistance and low operation & maintenance costs.
Covers three major sectors: photovoltaics, lithium batteries and hydrogen energy:
● Purification and rectification of chlorosilane byproducts in photovoltaic polysilicon production;
● Precise separation of carbonate solvents for lithium battery electrolytes;
● Acid gas (CO₂, H₂S) removal & absorption towers for hydrogen energy equipment, adapting to high-end precise production conditions of new energy.
Compatible with mainstream industrial tower processes, including precise vacuum rectification, atmospheric rectification, gas absorption, desorption, stripping, extractive rectification, azeotropic rectification, liquid-liquid extraction and other gas-liquid mass transfer working conditions.
| Comparison Item | Corrugated Silicon Carbide Mesh Packing | Open-Cell Silicon Carbide Foam | Corrugated Metal Mesh Packing (316L / Hastelloy) |
|---|---|---|---|
| Main Material | Porous silicon carbide (SiC) mesh | Monolithic silicon carbide with interconnected pores | Stainless steel, Hastelloy C276, titanium alloy |
| Core Structure | Regular stacked corrugated tower packing with continuous ordered flow channels | 3D interconnected foam pore skeleton | Corrugated structure pressed from perforated thin metal sheets / metal mesh |
| Core Positioning | Gas-liquid mass transfer, rectification and absorption separation for large-scale towers | Catalyst carrier, high-temperature filtration, small reactor internals | General precise rectification & separation under mildly corrosive environments |
| Corrosion Resistance | Excellent; resistant to strong acids, halides and organic solvents; incompatible with high-temperature concentrated alkali | Excellent; resistant to all types of acids, alkalis and high-temperature corrosive media | Ordinary stainless steel susceptible to chlorine & hydrofluoric acid; Hastelloy fails in high-temperature fluorine-containing media |
| Maximum Temperature Resistance | ≤850 °C (air / inert atmosphere) | ≤1200 °C | Stainless steel: 450 °C; Hastelloy: ≤600 °C |
| Fluid Pressure Drop | Low pressure drop, suitable for high-flow continuous tower equipment | Relatively high pressure drop, not fit for high-throughput rectification | Low pressure drop with excellent fluid permeability |
| Anti-Clogging Capacity | Moderate; fine dust easily clogs pores | Poor; microporous structure prone to blockage | Good, supports online cleaning & maintenance |
| Material Contamination Risk | Extremely low, no metal ion leaching | Extremely low, no impurity precipitation | Metal ion leaching occurs, restricted for high-purity processes |
| Cost Range | Mid-to-high price, higher cost performance than special metals | High price, high customization cost | 316L at low price; Hastelloy / titanium alloy at high price |
| Main Drawbacks | Brittle material; violent impact prohibited; intolerant to high-temperature concentrated alkali | Difficult forming process, unable to fabricate large regular tower packings | Prone to corrosive failure under fluorine-containing, strongly acidic working conditions |
Distinction of Precise Applicable Scenarios for Each Material
Applicable to strongly corrosive working conditions containing hydrofluoric acid, hydrochloric acid, chlorosilane and strong halides; large tower equipment for semiconductor high-purity chemical purification, photovoltaic polysilicon rectification, fluorochemicals, waste acid recovery and strongly corrosive waste gas scrubbing towers.
Not applicable to slurries with high solid content and high-temperature concentrated strong alkali conditions.
Applicable to high-temperature catalytic reaction carriers, high-temperature flue gas filtration, static gas-liquid mixing, microchannel small reactors and special high-temperature working conditions.
Applicable to conventional precise rectification under mild media without fluorine or strong chloride ions, such as separation of flavors and common fine chemical solvents, and general chemical projects with controllable budgets.
Not applicable to production lines involving hydrofluoric acid, concentrated hydrochloric acid or semiconductor high-purity chemicals.
② High-temperature catalysis, small-scale reaction, high-temperature filtration → Open-cell silicon carbide foam
③ Mild media without strong corrosion, conventional precise rectification → Stainless steel / Hastelloy metal mesh packing
